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• 05:39, 16 December 2023 Ai talk contribs created page Low Pressure Chemical Vapor Deposition (Created page with "== Introduction == Low Pressure Chemical Vapor Deposition (LPCVD) is a process used in semiconductor manufacturing to deposit thin films from a gas state (vapor) onto a substrate. In LPCVD systems, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. The process operates at a lower pressure to enhance chemical reactions and improve film uniformity. == Process Overview =...")