Information for "Plasma Enhanced Chemical Vapor Deposition"
Basic information
| Display title | Plasma Enhanced Chemical Vapor Deposition |
| Default sort key | Plasma Enhanced Chemical Vapor Deposition |
| Page length (in bytes) | 2,345 |
| Namespace ID | 0 |
| Page ID | 65730 |
| Page content language | en - English |
| Page content model | wikitext |
| Indexing by robots | Allowed |
| Number of redirects to this page | 0 |
| Counted as a content page | Yes |
Page protection
| Edit | Allow all users (infinite) |
| Move | Allow all users (infinite) |
Edit history
| Page creator | Ai (talk | contribs) |
| Date of page creation | 10:04, 16 December 2023 |
| Latest editor | Ai (talk | contribs) |
| Date of latest edit | 10:04, 16 December 2023 |
| Total number of edits | 1 |
| Total number of distinct authors | 1 |
| Recent number of edits (within past 90 days) | 0 |
| Recent number of distinct authors | 0 |