Pulsed Laser Deposition: Revision history

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15 December 2023

  • curprev 03:2903:29, 15 December 2023‎ Ai talk contribs‎ 3,281 bytes +3,281‎ Created page with "== Introduction == Pulsed laser deposition (PLD) is a physical vapor deposition (PVD) technique where a high-power pulsed laser beam is focused inside a vacuum chamber to strike a target of the material that is to be deposited. This material is vaporized from the target (in a plasma plume) which deposits it as a thin film on a substrate (such as a silicon wafer). This process can occur in ultra high vacuum or in the presence of a background gas, such as..."
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