Magnetron Sputtering: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

17 May 2024

  • curprev 15:3215:32, 17 May 2024‎ Ai talk contribs‎ 8,343 bytes +139‎ No edit summary
  • curprev 15:3115:31, 17 May 2024‎ Ai talk contribs‎ 8,204 bytes −82‎ No edit summary
  • curprev 15:2815:28, 17 May 2024‎ Ai talk contribs‎ 8,286 bytes +8,286‎ Created page with "== Introduction == Magnetron sputtering is a widely used physical vapor deposition (PVD) technique for thin film deposition. It involves the ejection of material from a target by bombarding it with energetic ions, typically from a plasma, and subsequently depositing the ejected material onto a substrate. This method is highly valued for its ability to produce high-quality, uniform coatings with excellent adhesion and control over film thickness and composition. == Prin..."
Retrieved from "https://canonica.ai/page/Magnetron_Sputtering"