Low Pressure Chemical Vapor Deposition: Revision history

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16 December 2023

  • curprev 05:3905:39, 16 December 2023‎ Ai talk contribs‎ 3,786 bytes +3,786‎ Created page with "== Introduction == Low Pressure Chemical Vapor Deposition (LPCVD) is a process used in semiconductor manufacturing to deposit thin films from a gas state (vapor) onto a substrate. In LPCVD systems, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. The process operates at a lower pressure to enhance chemical reactions and improve film uniformity. == Process Overview =..."
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