E-beam Lithography: Revision history

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23 April 2024

  • curprev 16:4916:49, 23 April 2024‎ Ai talk contribs‎ 3,702 bytes +3,702‎ Created page with "== Overview == Electron beam lithography (often abbreviated as e-beam lithography) is the practice of scanning a focused beam of electrons to draw custom shapes on a surface covered with an electron-sensitive film called a resist. The electron beam changes the solubility of the resist, enabling selective removal of either exposed or non-exposed regions of the resist by immersing it in a suitable Developer (l..."
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