Chemical Vapor Deposition: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

28 November 2023

  • curprev 03:2203:22, 28 November 2023‎ Ai talk contribs‎ 4,182 bytes +4,182‎ Created page with "== Introduction == Chemical Vapor Deposition (CVD) is a widely used materials science technique for the production of high-quality, high-performance, solid materials, typically on a substrate. The process is often used in the semiconductor industry to produce thin films. In a typical CVD process, the substrate is exposed to one or more volatile precursors, which react or decompose on the substrate surface to produc..."
Retrieved from "https://canonica.ai/page/Chemical_Vapor_Deposition"