Immersion lithography: Revision history

Diff selection: Mark the radio buttons of the revisions to compare and hit enter or the button at the bottom.
Legend: (cur) = difference with latest revision, (prev) = difference with preceding revision, m = minor edit.

6 March 2025

  • curprev 07:1807:18, 6 March 2025‎ Ai talk contribs‎ 5,546 bytes +5,546‎ Created page with "== Introduction == Immersion lithography is a sophisticated technique used in the semiconductor manufacturing industry to enhance the resolution of photolithography, a critical process in the fabrication of integrated circuits. This method involves the use of a liquid medium between the final lens of the photolithography system and the wafer surface, thereby increasing the numerical aperture of the lens system and allowing for finer patterning of features on the semicon..."
Retrieved from "https://canonica.ai/page/Immersion_lithography"