Atomic Layer Deposition: Revision history

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28 November 2023

  • curprev 02:5302:53, 28 November 2023‎ Ai talk contribs‎ 3,782 bytes +3,782‎ Created page with "== Introduction == Atomic Layer Deposition (ALD) is a thin film deposition technique based on the sequential use of a gas phase chemical process. The ALD process is divided into two half reactions, kept separate by purging with an inert gas such as argon. Due to its self-limiting nature, ALD offers precision and control over thickness, excellent uniformity across large areas and conformality on complex 3D surfaces. Image:Detail-41339.jpg|thumb|center|A photograph of..."
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